Candid, low-contrast portrait of a contemporary art curator in a dimly lit studio setting, desaturated dark tones, 35mm photography.
Candid, low-contrast portrait of a contemporary art curator in a dimly lit studio setting, desaturated dark tones, 35mm photography.
EVALUATION PANEL

The Curatorial Panel

A joint committee bridging the critical distance of contemporary art with deep machine-learning expertise. We evaluate submissions on conceptual depth and algorithmic subversion.

Straight-on, architectural gallery portrait of a senior museum curator, low-key moody lighting, desaturated dark tones, 35mm.
Straight-on, architectural gallery portrait of a senior museum curator, low-key moody lighting, desaturated dark tones, 35mm.
Close-up of a digital screen showing complex generative patterns, soft ambient screen glow, desaturated dark tones, 35mm.
Close-up of a digital screen showing complex generative patterns, soft ambient screen glow, desaturated dark tones, 35mm.
THE PANELISTS

The 2025 Jury

MUSEUM CURATOR

Dr. Clara Vance

Senior curator of digital media at the Tate Modern. Dr. Vance focuses on the intersection of generative systems and historical archival practices, bringing curatorial rigor to machine-collaborative art.

MACHINE LEARNING RESEARCHER

Prof. Kenji Sato

Principal scientist at the Tokyo Institute of Technology. Prof. Sato investigates latent space visualization and neural architecture, analyzing the technical subversion behind generative models.

CURATORIAL RIGOR

The Selection Framework

Our double-blind evaluation process isolates the work from technological hype. Submissions are judged purely on conceptual depth, technical subversion, and their ability to challenge the traditional boundaries of creative agency.

By pairing institutional curators with machine-learning pioneers, we establish a rigorous critical standard. We do not evaluate the computational speed; we examine the aesthetic resonance and the ghost in the machine.

Submit Your Work

The entry portal for the 2025 cycle is now open. Review our technical guidelines and present your machine-collaborative projects to our international panel.